Klostermann, Ulrich: search on Z-Library

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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Experimental validation of rigorous, 3D profile models for negative-tone develop resists

Lai, Kafai, Erdmann, Andreas, Gao, Weimin, Klostermann, Ulrich, Kamohara, Itaru, Schmoeller, Thomas, Lucas, Kevin, Demmerle, Wolfgang, De Bisschop, Peter, Mailfert, Julien

Year:

2014

Language:

english

File:

PDF, 960 KB

english, 2014

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Modeling of NTD resist shrinkage

Hohle, Christoph K., Gronheid, Roel, Mülders, Thomas, Stock, Hans-Jürgen, Küchler, Bernd, Klostermann, Ulrich, Gao, Weimin, Demmerle, Wolfgang

Year:

2017

Language:

english

File:

PDF, 1.00 MB

english, 2017

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Rigorous wafer topography simulation for investigating wafer alignment quality and robustness

Lai, Kafai, Erdmann, Andreas, Morgana, Nicoló, Gavrilin, Dmitrii, Greiner, Andreas, Hofmann, Detlef, Kamohara, Itaru, Klostermann, Ulrich, Moeller, Holger, Preuninger, Juergen

Year:

2015

Language:

english

File:

PDF, 12.71 MB

english, 2015

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Application of an inverse Mack model for negative tone development simulation

Gao, Weimin, Klostermann, Ulrich, Mülders, Thomas, Schmoeller, Thomas, Demmerle, Wolfgang, De Bisschop, Peter, Bekaert, Joost

Year:

2011

Language:

english

File:

PDF, 2.20 MB

english, 2011

5

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - Practical resist model calibration for e-beam direct write processes

Schulz, Martin, Hosono, Kunihiro, Stock, Hans-Jürgen, Klostermann, Ulrich, Hoppe, Wolfgang, Bomholt, Lars, Jaschinsky, Philipp, Choi, Kang-Hoon, Gutsch, Manuela, Sailer, Holger, Martens, Stephan

Year:

2010

Language:

english

File:

PDF, 2.36 MB

english, 2010

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Fine calibration of physical resist models: the importance of Jones pupil, laser bandwidth, mask error and CD metrology for accurate modeling at advanced lithographic nodes

Moon, Seongho, Yang, Seunghune, Shamsuarov, Artem, Kim, Eunju, Ser, Junghoon, Kim, Youngchang, Choi, Seongwoon, Kang, Changjin, Klostermann, Ulrich, Küchler, Bernd, Lewellen, John, Schmöller, Thomas,

Year:

2011

Language:

english

File:

PDF, 2.79 MB

english, 2011

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Optical Microlithography XXX - Experimental characterization of NTD resist shrinkage

Erdmann, Andreas, Kye, Jongwook, Küchler, Bernd, Mülders, Thomas, Taoka, Hironobu, Gao, Weimin, Klostermann, Ulrich, Kamimura, Sou, Grozev, Grozdan, Yoshidome, Masahiro, Shirakawa, Michihiro, Li, Waik

Year:

2017

Language:

english

File:

PDF, 764 KB

english, 2017

8

Primary malignant bone tumors and solitary metastases of the thoracolumbar spine: results by management with total en bloc spondylectomy

Ingo Melcher, Alexander C. Disch, Cyrus Khodadadyan-Klostermann, Stefan Tohtz, Mirko Smolny, Ulrich Stöckle, Norbert P. Haas, Klaus-Dieter Schaser

Journal:

European Spine Journal

Year:

2007

Language:

english

File:

PDF, 322 KB

english, 2007

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Role of 3D photo-resist simulation for advanced technology nodes

Narayana Samy, Aravind, Conley, Will, Seltmann, Rolf, Kahlenberg, Frank, Schramm, Jessy, Küchler, Bernd, Klostermann, Ulrich

Year:

2013

Language:

english

File:

PDF, 647 KB

english, 2013

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - SEM signal emulation for 2D patterns

Erdmann, Andreas, Kye, Jongwook, Sukhov, Evgenii, Muelders, Thomas, Klostermann, Ulrich, Gao, Weimin, Braylovska, Mariya

Year:

2016

Language:

english

File:

PDF, 504 KB

english, 2016

11

Calibration of physical resist models: methods, usability, and predictive power

Klostermann, Ulrich

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2009

Language:

english

File:

PDF, 926 KB

english, 2009

12

Calibration of physical resist models for simulation of extreme ultraviolet lithography

Klostermann, Ulrich K.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2011

Language:

english

File:

PDF, 956 KB

english, 2011

13

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Calibration and verification of a stochastic model for EUV resist

Gao, Weimin, Philippou, Alexander, Klostermann, Ulrich, Siebert, Joachim, Philipsen, Vicky, Hendrickx, Eric, Vandeweyer, Tom, Lorusso, Gian, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 1.57 MB

english, 2012

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Computational process optimization of array edges

Küchler, Bernd, Shamsuarov, Artem, Mülders, Thomas, Klostermann, Ulrich, Yang, Seung-Hune, Moon, Seongho, Domnenko, Vitaliy, Park, Sung-Woon, Conley, Will

Year:

2012

Language:

english

File:

PDF, 1.84 MB

english, 2012

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Experimental validation of stochastic modeling for negative-tone develop EUV resists

Wood, Obert R., Panning, Eric M., Kamohara, Itaru, Gao, Weimin, Klostermann, Ulrich, Schmöller, Thomas, Demmerle, Wolfgang, Lucas, Kevin, De Simone, Danilo, Hendrickx, Eric, Vandenberghe, Geert

Year:

2015

Language:

english

File:

PDF, 2.10 MB

english, 2015

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Calibration of physical resist models: methods, usability, and predictive power

Klostermann, Ulrich K., Henderson, Clifford L., Mülders, Thomas, Ponomarenco, Denis, Schmöller, Thomas, Van de Kerkhove, Jeroen, De Bisschop, Peter

Year:

2009

Language:

english

File:

PDF, 645 KB

english, 2009

17

Valproic acid-induced pancreatitis: 16 new cases and a review of the literature

Thorsten Gerstner, Deike Büsing, Nellie Bell, Elke Longin, Johannes-Martin Kasper, Wolfgang Klostermann, Burkhard Hebing, Folker Hanefeld, Ulrich Eckel, Reiner Hoffmann, Ulrich Bettendorf, Birgit Weid

Journal:

Journal of Gastroenterology

Year:

2007

Language:

english

File:

PDF, 160 KB

english, 2007

18

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Source-mask optimization incorporating a physical resist model and manufacturability constraints

Mülders, Thomas, Domnenko, Vitaliy, Küchler, Bernd, Stock, Hans-Jürgen, Klostermann, Ulrich, De Bisschop, Peter, Conley, Will

Year:

2012

Language:

english

File:

PDF, 2.60 MB

english, 2012

19

Influence of reference layer stability on the switching performance of sub-micron-sized magnetic tunnel junctions

Klostermann, Ulrich, Park, Chanro, Raberg, Wolfgang, Dahmani, Faiz, Ruehrig, Manfred

Journal:

Journal of Applied Physics

Year:

2006

Language:

english

File:

PDF, 389 KB

english, 2006

20

Cancer-related issues of CD147

Weidle, Ulrich H., Scheuer, Werner, Eggle, Daniela, Klostermann, Stefan, Stockinger, Hannes

Journal:

Cancer genomics & proteomics

Year:

2010

Language:

english

File:

PDF, 760 KB

english, 2010

21

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Design-Process-Technology Co-optimization for Manufacturability VIII - Layout optimization of DRAM cells using rigorous simulation model for NTD

Sturtevant, John L., Capodieci, Luigi, Jeon, Jinhyuck, Kim, Shinyoung, Park, Chanha, Yang, Hyunjo, Yim, Donggyu, Kuechler, Bernd, Zimmermann, Rainer, Muelders, Thomas, Klostermann, Ulrich, Schmoeller,

Year:

2014

Language:

english

File:

PDF, 1.34 MB

english, 2014

22

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Optical Microlithography XXIV - Physical simulation for verification and OPC on full chip level

Shim, Seongbo, Moon, Seongho, Kim, Youngchang, Choi, Seongwoon, Kim, Younghee, Küchler, Bernd, Klostermann, Ulrich, Do, Munhoe, Lee, Sooryoung, Dusa, Mircea V.

Year:

2011

Language:

english

File:

PDF, 1.41 MB

english, 2011

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Source and mask optimization applications in manufacturing

Lim, ChinTeong, Temchenko, Vlad, Klostermann, Ulrich, Domnenko, Vitaliy, Schneider, Jens, Sarlette, Daniel, Meusel, Ingo, Kaiser, Dieter, Ploss, Ralf

Year:

2011

Language:

english

File:

PDF, 683 KB

english, 2011

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